Stanford Advanced Materials Corporation (SAM)
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SAM - Model OFHC -Copper Backing Plates
Machined from oxygen-free, high-conductivity copper. For regular, circular disc-type sputtering sources. Most sputter sources accept a 0.125″ (1/8″) thick target bonded to a 0.125″ thick backing plate. For targets of other thicknesses, choose the backing plate thickness to adjust the total thickness to 0.250″ (1/4″) to suit most applications.
