SAM - Model ST0001 -Aluminum Sputtering Target (Al)
Aluminum, or Aluminium, is a silvery-white, soft, non-magnetic and ductile metal in the boron group. By mass, aluminum makes up about 8% of the Earth’s crust; it is the third most abundant element after oxygen and silicon and the most abundant metal in the crust, though it is less common in the mantle below. The chief ore of aluminum is bauxite. Aluminum metal is highly reactive, such that native specimens are rare and limited to extreme reducing environments. Instead, it is found combined in over 270 different minerals. When evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. It is widely used in the aerospace, automotive lighting, OLED, and optical industries.
Application of Aluminum Sputtering Target
The metal has good thermal properties and is malleable and ductile. Aluminum and its alloys are widely used for various applications including aircraft assemblies and engine parts.
Target Bonding of Aluminum Sputtering Target
Indium Bonding and Elastomeric Target Bonding Service are available for aluminum sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Aluminum Sputtering Target Manufacturing processes
- Production and purification of aluminum
Aluminum is obtained by extracting Al2O3 from bauxite and then electrolyzing Al2O3 in molten cryolite. The purity of aluminum obtained by this method is generally above 99%, but it is still cannot be a raw material for producing aluminum targets. The first and the most important requirement of aluminum target for producing aluminum target is high purity. The high-purity aluminum used in aluminum target is produced by segregation method, three-layer electrolysis method or combined regional melting method. Thus it is much more expensive than industrial pure aluminum. SAM provides aluminum sputtering target of high quality and at a competitive price.
- Deformation treatment of aluminum target
As a raw material, high-purity aluminum ingot is forged, rolled, and heated, so that the crystal grains in the aluminum ingot are fined and the density is increased to meet the requirements of the aluminum target required for sputtering. Then, the deformed high-purity aluminum material is processed into a target size required for the vacuum coater. The requirements for aluminum target processing are high precision and high surface quality.
Packing
Our aluminum sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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SAM’s aluminum sputter targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
- Material Type Aluminum
- Symbol Al
- Color/Appearance Silvery, Metallic
- Melting Point 660°C
- Density 2700 kg/m3
- Sputter DC
- Type of Bond Indium, Elastomer
- Comments Alloys W/Mo/Ta. Flash evap or use BN crucible
- Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
- Thick: 0.125″, 0.250″