SiliNOx - System Used for Cleaning High NOx Concentrations

SiliNOx systems are used for cleaning high NOx concentrations with major deviations (peaks). One of the applications is cleaning material flows after a wet-etching process used for silicon ingots or wafers. SiliNox can recognize NOx concentration and purifies the deviations (peaks) by  means of a flexible conditioning of exhaust air flow. Depending on the requirements of material flows SiliNOx systems can be combined with acid or alkaline rinsing systems. Intelligent control/measuring systems can guarantee observing required pure gas levels. SiliNOx systems are characterized by a high level of availability, low running costs and durability. We can ensure this as we use high-quality materials and tried and tested components.