EOS recently patented the innovative SPESe technology with the aim of greatly improving the particle size sensitivity for the nanoparticle world. EOS is currently developing the SPESe technology within its laboratories. Market release expected by next years. Stay Tuned!
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EOS - Model SPESe -Technology for Nanoparticle Size Sensitivity
FromEOS Technologies
EOS Technologies has recently patented the SPESe technology, a groundbreaking advancement aimed at significantly enhancing particle size sensitivity in the domain of nanoparticles. The technology is currently under development in EOS's laboratories and is anticipated to be released to the market in the coming years. SPESe technology is designed to offer superior precision and accuracy in measuring nanoparticle sizes, providing a valuable tool for researchers and industries dealing with various nanoparticle applications. By improving the sensitivity and resolution, SPESe technology promises to facilitate more detailed and accurate particle analysis, enabling advancements in fields like materials science, pharmaceuticals, and environmental studies. The development of this technology underscores EOS's commitment to pushing the boundaries of innovation in particle analysis.