Chrysalis Scientific Technologies Inc. products

The increasing demands for higher yields and more consistent performance in the fabrication of III-V compound semiconductor devices dictate the need for more stringent contamination control. Nowhere is this more evident than in III-V compound semiconductor epitaxy processes. Gas contaminants, especially moisture and oxygen-containing species, adversely affect film quality and reduce yields. Since contamination sources cannot be entirely eliminated, the most effective solution is to purify arsine as close to the point-of-use as possible with an effective and efficient purification medium. ASX-II is a new inorganic purification medium that removes H₂O and is expected to remove Oxy-acid impurities. ASX-II offers the highest lifetimes for the removal of moisture. ASX-II has a wide range of applications, including GaAs and InGaAsP MOCVD processes, and is available in a wide range of purifier sizes: from Point-of-Use to Proximate

The Next Generation Purifier for Inert & Flammable Gases. All the Benefits of NANOCHEM OMX with Efficient Hydrocarbon Removal NANOCHEM OMX purification medium has long been the industry standard for purifying inert and flammable gases for a variety of semiconductor applications, including low temperature SiGe Epi. NANOCHEM OMX-Plus offers all the benefits of NANOCHEM OMX medium — the highest lifetimes and the best efficiencies for impurity removal as well as patented true endpoint detection to give advance warning of purifier depletion. OMX-Plus also offers removal of trace non-methane aliphatic and aromatic hydrocarbons from source gases and system component outgassing.

NANOCHEM Metal-X (a.k.a. MTX) purification medium is a super-activated inorganic compound, which removes moisture (H₂O) from corrosive gases, reducing or preventing the corrosion of components of the gas delivery system. Such corrosion products can generate killer volatile and non-volatile metal impurities that can significantly affect process yields and device yields as well as shorten the useful life of the gas delivery system. NANOCHEM Metal-X also removes volatile metal impurities, often present as volatile metalhalides and metal oxy-halides in the feedstock (corrosive gas, as supplied by the manufacturer) and from reaction of the corrosive gas with the piping components. Such volatile impurities cannot be removed by particle filters. NANOCHEM Metal-X is the only corrosive gas purification media that has been proven to remove both moisture and metals (volatile and non-volatile) from corrosive gases.

NHX-Plus is an inorganic purification medium that not only removes H₂O, CO₂ and O₂, but also removes hydrogen sulfide (H₂S) and hydride impurities, such as silane, germane and siloxanes. NHX-Plus offers the highest lifetimes for the removal of moisture and the best efficiency to remove carbamates (NH₃-CO₂ complexes). NHX-Plus has a wide range of applications, including next generation gallium nitride MOCVD processes, and is available in a wide range of purifier sizes: point-of-use to bulk purifiers.

NANOCHEM HCX Purifiers are designed to remove trace hydrocarbons from inert gases and hydrogen. An example of a process sensitive to hydrocarbon contamination is DUV lithography. Deposition of carbon-based films from purge gas contaminants on the optical components decreases light throughput and negatively affects the patterning process.  NANOCHEM HCX purification medium, the active component in White Knight (WK-Series) Purifiers, removes non-methane hydrocarbons with sub-ppb efficiency and high capacity for extended purifier lifetime.

NANOCHEM A-300I series purifiers offer a new, patented breakthrough technology alternative to the purification of 100% AsH3 and PH3 used in the III-V Compound Semiconductor Epitaxy Processes, with a `drop-in` replacement design. Gas contaminants, especially moisture and oxygen-containing species, adversely affect process quality and reduce yields. In AsH3 and PH3, moisture is known to increase with cylinder use. NANOCHEM A-300I purifiers provide protection from such moisture surges from source AsH3 and PH3 gases, and from system upsets, such as leaks in the process line and cylinder changes.

The NANOCHEM C/CL-Series Purifiers are designed for `ultra-clean` multi-tool, single-source or point-of-use applications. NANOCHEM C/CL-Series Purifiers eliminate virtually all variables that cause contamination. Gas impurities may be present in gas cylinders, and can also be introduced through leaks in the line or during cylinder changes. The C/CL-Series Purifiers are designed for the highest possible purity. The bypass valve allows purging to ensure no atmospheric contamination enters the purifier. The outlet particle filter is installed downstream of all valves to ensure no particles can escape the purifier. C-Series Purifiers are provided with exhaustible enclosure for use with flammable gases. Standard purification media bed volumes for the three available C/CL-Series Purifiers are: 300, 500, 2000 ml. Media refills are available through Matheson Tri-Gas, Inc., for all sizes.

The NANOCHEM H/HP-Series Purifiers provide economical gas purification in multi-tool or single-source applications. With a welded bypass valve incorporated in the purifier unit, H/HP-Series purifiers are often used in gas enclosures, both source and purge gas, where space is limited. Its low width makes it ideal for installation in restricted space or gas jungle applications where multiple vertical gas lines are being run. Purification media refills are available through Matheson Tri-Gas, Inc.

The NANOCHEM L-Series Purifier provides economical purification in multi-tool or single-source applications. Gas impurties such as moisture and oxygen adversely affect process quality. Those impurities are present in gas cylinders and can also be introduced through leaks in the line or during cylinder changes. NANOCHEM purification media react with such impurities to deliver consistently pure gas to the process, improving product consistency and yields.

The NANOCHEM L-Series ByPass Module enables an L- Series purifier to be switched in or out of the gas flow circuit without interrupting the gas stream. The ByPass Module facilitates replacement of a depleted purifier and shortens the time required for purging. The ByPass Module is also used during equipment start-up and maintenance, when purge gases flow from the source to the point-of use. Installation of a bypss is strongly recommended to avoid contamination and partial depletion of purifier during installation.