NANOCHEM - HCX - Inert Gas Purifier

FromChrysalis Scientific Technologies Inc.

SHARE

NANOCHEM HCX Purifiers are designed to remove trace hydrocarbons from inert gases and hydrogen. An example of a process sensitive to hydrocarbon contamination is DUV lithography. Deposition of carbon-based films from purge gas contaminants on the optical components decreases light throughput and negatively affects the patterning process. NANOCHEM HCX purification medium, the active component in White Knight (WK-Series) Purifiers, removes non-methane hydrocarbons with sub-ppb efficiency and high capacity for extended purifier lifetime.

Most popular related searches

gas purification

non-methane hydrocarbons

gas purification system

hydrocarbons removal

trace hydrocarbons

hydrocarbons contamination

particle filter

methane removal

Purge gas purification for photolithography where trace hydrocarbons are detrimental to transmission of optical components (carbon deposits)
Compatible gases include Nitrogen (N2), Helium (He),Neon (Ne), Argon (Ar), Krypton (Kr), Xenon (Xe), Hydrogen (H2), Deuterium (D2), CDA, and Sulfur Hexafluoride (SF6)

Custom-designed adsorbent material for point-of-use hydrocarbon removal offering:
High Capacity
Long Lifetimes
Sub-ppb Efficiency for non-methane hydrocarbon removal in inert gases (N2, He, Ne, Ar, Kr, Xe) and Hydrogen (H2)
Low Overall Cost of Ownership
Room temperature operation - no power required
No conditioning required
Easy to install and operate
Media refills available for WK-500F-HCX and WK-2500FHCX purifier models
Patented technology

0.003 µm particle filter with 9-log retention (99.9999999%)
Internal surface finish < 10 µin R_a
Metal parts of Stainless Steel, Type 316L
Maximum operating temperature of 40°C (104°F)