MSP Corporation
9 products found

MSP Corporation products

MSP - Model 2300G3 - Particle Deposition System

Precision. Accuracy. Repeatability. Traceability. Flexibility. MSP`s 2300G3 Particle Deposition System for producing advanced process technology wafer calibration standards with particle deposits down to 10nm-enabling surface scanner inspection system metrology for tomorrow`s process technology.

NanoSilica - Model 2260 - Particle Size Standards

NanoSilica Size Standards from MSP Corporation are concentrated aqueous suspensions of SiO2 particles with highly uniform size distributions. These particle size standards, currently available in nominal sizes ranging from 15 to 200nm, are ideally suited for producing high-quality calibration standards for the next generation of wafer inspection tools and systems. Unparalleled quality can be achieved when NanoSilica Size Standards are deposited by MSP's 2300G3 Particle Deposition System onto wafers.

VPG Filter - Model 2920-A3 - Ultra- High Efficiency Filter Designed for Vapor and Process Gas Filtration

The Model 2920 VPG Filter is an ultra- high efficiency filter designed for Vapor and Process Gas filtration. The VPG Filter has an estimated particle penetration of less than one part per trillion (ppt), and a filter efficiency of 99.9999999999% (twelve 9s) at 2.5 nm. This 2.5nm, part-per-trillion particle penetration, twelve-9 efficiency rated filter is the highest rated filter in the filtration industry for semiconductor applications. Conventional high-purity, point-of-use gas filters are used in a compressed gas line for particle removal. In contrast, the VPG™ filter is generally used downstream of a vaporizer under vacuum flow conditions to remove particles from a gas/vapor mixture with the carrier gas—such as nitrogen, argon or helium—being mixed with a chemical precursor vapor containing hafnium, zirconium, or other elemental species of interest for atomic layer deposition (ALD) as well as chemical vapor deposition (CVD) applications.

Model 2800 - Turbo Vaporizers for Liquid Source Vaporization

We offer a series of Turbo Vaporizers for liquid source vaporization by direct liquid injection for thin film deposition by Chemical Vaporizer Deposition (CVD), Plasma Enhanced CVD (PECVD), and Atomic Layer Deposition (ALD) processes. Each vaporizer is customized for a specific application to meet the individual needs of the customer. MSP’s vaporizers are known for their accuracy, repeatability, low maintenance, and low in-film and surface contamination features. High-capacity vaporizers are also available for industrial applications.

MSP - Model 2800PE - Turbo Vaporizers Use of a Precision Piezo-Valve

MSP offers several high performance vaporizers, which are referred to as performance-enhanced vaporizers, or PE vaporizers. The available models include the model 2800PE, 2820PE, 2830PE and 2840PE. These PE vaporizers make use of a precision piezo-valve to control the rate of liquid flow into an atomizer to form very fine droplets for vaporization, leading to reduced thermal decomposition and by-products formation. The PE vaporizer design also increases the temperature stability of the system, while permitting the vaporizer to operate up to 300ºC in some models. The result is improved film quality as well as reduced response time of the vaporization system.

MSP - Model 2910 - Multifunction Controller for the PE Vaporizers

MSP offers several high performance vaporizers referred to as performance-enhanced vaporizers, or PE vaporizers. The available models include the model 2800PE, 2820PE, 2830PE and 2840PE. These PE vaporizers use a precision piezo-valve to control the rate of liquid flow into an atomizer to form small fine droplets for vaporization to minimize thermal decomposition and the formation of undesirable by-products.

VPG Filter - Model 2920-A6 - Ultra- High Efficiency Filter Designed for Vapor and Process Gas Filtration

The Model 2920 VPG Filter is an ultra- high efficiency filter designed for Vapor and Process Gas filtration. The VPG Filter has an estimated particle penetration of less than one part per trillion (ppt), and a filter efficiency of 99.9999999999% (twelve 9s) at 2.5 nm. This 2.5nm, part-per-trillion particle penetration, twelve-9 efficiency rated filter is the highest rated filter in the filtration industry for semiconductor applications. Conventional high-purity, point-of-use gas filters are used in a compressed gas line for particle removal. In contrast, the VPG™ filter is generally used downstream of a vaporizer under vacuum flow conditions to remove particles from a gas/vapor mixture with the carrier gas—such as nitrogen, argon or helium—being mixed with a chemical precursor vapor containing hafnium, zirconium, or other elemental species of interest for atomic layer deposition (ALD) as well as chemical vapor deposition (CVD) applications.

MSP - Model 2820 - Turbo-Vaporizer for Liquid Source Vaporization

We offer a series of Turbo Vaporizers for liquid source vaporization by direct liquid injection for thin film deposition by Chemical Vaporizer Deposition (CVD), Plasma Enhanced CVD (PECVD), and Atomic Layer Deposition (ALD) processes. Each vaporizer is customized for a specific application to meet the individual needs of the customer. MSP’s vaporizers are known for their accuracy, repeatability, low maintenance, and low in-film and surface contamination features. High-capacity vaporizers are also available for industrial applications.

MSP - Model 2940 - Liquid Flow Controller

The Model 2940 is a family of controllers for liquid flow control. Each controller is comprised of a sensor to sense the mass flow rate of the liquid and generate a voltage to operate the piezoelectric control valve in the 2800PE series Turbo Vaporizer™. This all-digital flow control system is suitable for maintaining steady liquid flow rate as well as for generating repeatable short duration vapor pulses for ALD applications.