Powall products

ALD deposits ultrathin films with Angstrom level precision allowing the growth of a monolayer on powders. This solvent free process doesn’t require complex evaporation or waste treatment. ALD has superior control over nanocoating thickness, low waste generation and is flexible for a wide range of both coating and powder chemistries. Powall’s nanocoating technology takes the advantages of ALD and goes one step further! We produce nanocoatings with ALD level control but cost effectively and at scale.

Powall’s revolutionary continuous reactor allows for nanocoating of powders. The powder travels through the reactor in the gas-phase and is precisely coated. The design is elegantly simple and runs at atmospheric pressure with few moving parts. This reactor design is versatile and can easily be tailored to meet the different requirements of our different partners. The system is cost-effective to run and has a small footprint making it easy to retrofit into existing production lines.