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Sempa - Model ALD / ALE - Enabling Next Generation Devices

Thin Film processing on the scale of single atomic layers is gaining growing interest with the increasing demand of modern structures in microelectronics. Multiple patterning with Atomic Layer Deposition ALD, the deposition of high-k films like Al2O3 and Zr/Hf Oxides or 3D structures are key processes for technology milestones beyond 10 nm in logic and memory.