NANOCHEM - Metal-X - Corrosive Gas Purifier
NANOCHEM Metal-X (a.k.a. MTX) purification medium is a super-activated inorganic compound, which removes moisture (H2O) from corrosive gases, reducing or preventing the corrosion of components of the gas delivery system. Such corrosion products can generate killer volatile and non-volatile metal impurities that can significantly affect process yields and device yields as well as shorten the useful life of the gas delivery system. NANOCHEM Metal-X also removes volatile metal impurities, often present as volatile metalhalides and metal oxy-halides in the feedstock (corrosive gas, as supplied by the manufacturer) and from reaction of the corrosive gas with the piping components. Such volatile impurities cannot be removed by particle filters. NANOCHEM Metal-X is the only corrosive gas purification media that has been proven to remove both moisture and metals (volatile and non-volatile) from corrosive gases.
- HCl – Hydrogen Chloride
- CO – Carbon Monoxide
- HBr – Hydrogen Bromide
- NO – Nitric Oxide*
- SiH2Cl2 – Dichlorosilane or DCS*
- CCl4 – Carbon Tetrachloride
- SiHCl3 – Trichlorosilane or TCS*
- BCl3 – Boron Trichloride*
- Cl2 – Chlorine*
- SiCl4 – Silicon Tetrachloride*
NANOCHEM Metal-X removes:
- Moisture (H2O)
- Particulates (non-volatiles)
- Volatile Transition Metal compounds of Fe, Mo, Cr, Ti,Ni, Mn
- Improves & ensures gas purity for process consistency
- Improves process performance & yields
- Protects equipment from corrosion
- Applicable for purification at the
- Source (at full cylinder pressure), and
- Point-of-use (< 100 psig) at the process tool
MTX offers Highest Lifetimes
- ~ 30% higher capacity than previous generation of NANOCHEM corrosive gas media
MTX offers Improved Efficiency
- < 1 ppb H2O (in N2 matrix by APIMS)
- < 100 ppb H2O (LDL in HBr by FTIR & Laser IR / Lamda Scan)
- No external power source required
- Does not require heating or cooling
LDL Lower Detection Limit of Analytical Test Method
APIMS Atmospheric Pressure Ionization Mass Spectrometry
FTIR Fourier Transform Infrared Spectrometry
ICP-MS Inductively Coupled Plasma with Mass Spectrometry
- Reduce metals in etching and chamber cleaning
- Reduce metals in Epi Si CVD source gas
- Fiber optics & other ultra-high purity applications