Helios DualBeam - Model 5 Hydra -Dualbeam Microscopes

The Helios 5 Hydra DualBeam combines the new, innovative multi-ion-species plasma FIB (PFIB) column with the monochromated Thermo Scientific Elstar UC+ SEM Column to provide advanced focused ion- and electron-beam performance. Intuitive software and an unprecedented level of automation and ease-of-use allow observation and analysis of relevant subsurface volumes.

Helios 5 Hydra DualBeam for Materials Science
High-quality sample preparation is critical for successful high-resolution material analysis with STEM or TEM. It is also considered to be one of the most challenging and time-consuming tasks in materials characterization labs. Conventional methods used to prepare ultra-thin samples required for S/TEM are slow and can require many hours, or even days, of effort by highly trained personnel. This is further complicated by the variety of different materials and the need for site-specific information. Plasma FIB, coupled with proprietary and innovative software for automation and ease of use, resolves many of these challenges.

Xenon plasma FIB, for example, is the standard for gallium-free sample preparation, which is vital for sensitive samples such as aluminum-containing materials. The addition of fast switching between all four ion beam species of the Helios 5 Hydra DualBeam goes even further to meet the needs of each of your individual materials, allowing you to find the ideal conditions to prepare the highest quality samples possible.

Helios 5 Hydra DualBeam for Life Sciences
The Helios 5 Hydra DualBeam opens new avenues for FIB applications in the life sciences, enabling high-resolution, large-volume and 3D visualization. It offers higher throughput and optimized milling performance compared to traditional gallium FIB for all biological samples, regardless of the sample preparation method.

For example, oxygen plasma FIB is compatible with all resins and sample preparation protocols commonly used today and provides superior results in terms of data acquisition efficiency and image quality.

Large application space
Largest application space with unique ion source delivering four fast, switchable ion species: Xe, Ar, O, N

High throughput and quality
High-throughput, high-quality, and statistically relevant 3D characterization, cross sectioning and micromachining using the next-generation 2.5 μA plasma FIB column.

Advanced automation
Fastest and easiest, automated, multi-site in situ and ex situ TEM sample preparation and cross-sectioning using optional AutoTEM 5 Software

High-quality sample preparation
High-quality gallium-free TEM and APT sample preparation with xenon, argon or oxygen thanks to the new PFIB column enabling 500 V final polishing and delivering superior performance at all operating conditions.

Short time to nanoscale
Shortest time to nanoscale information for users with any experience level with SmartAlign and FLASH technologies

Complete sample information
The most complete sample information with sharp, refined and charge-free contrast obtained from up to six integrated in-column and below-the-lens detectors

Electron and ion beam-induced deposition and etching
Most advanced capabilities for electron and ion beam-induced deposition and etching on DualBeam systems with optional Thermo Scientific MultiChem or GIS Gas Delivery Systems.

Precise sample navigation
Tailored to individual application needs thanks to the high stability and accuracy of the 150 mm Piezo stage or the flexible 110 mm stage and optional in-chamber Thermo Scientific Nav-Cam Camera.

Artifact-free imaging
Based on integrated sample cleanliness management and dedicated imaging modes such as SmartScan and DCFI Modes

Electron beam resolution   

Helios 5 Hydra CX DualBeam

• At optimum WD:
• 0.7 nm at 1 kV
• 1.0 nm at 500 V (ICD)
• At coincident point:
• 0.6 nm at 15 kV
• 1.2 nm at 1 kV
• Helios 5 Hydra UX DualBeam
• Electron beam parameter space   
• Electron beam current range: 0.8 pA to 100 nA at all accelerating voltages
• Accelerating voltage range: 350 V – 30 kV
• Landing energy range: 20* eV – 30 keV
• Maximum horizontal field width: 2.3 mm at 4 mm WD

Ion optics   

High-performance PFIB column with unique inductively coupled plasma (ICP) source supporting four ion species with fast switching capability

• Ion species (primary ion beam): Xe, Ar, O, N
• Switching time <10 minutes, only software operation
• Ion beam current range: 1.5 pA to 2.5 µA
• Accelerating voltage range: 500V – 30 kV
• Maximum horizontal field width: 0.9 mm at beam coincidence point
• Xe Ion beam resolution at coincident point
• <20 nm at 30 kV using preferred statistical method
• <10 nm at 30 kV using selective edge method

Chamber   

• E- and I-beam coincidence point at analytical WD (4 mm SEM)
• Ports: 21
• Inside width: 379 mm
• Integrated plasma cleaner

Detectors   

• Elstar Column in-lens SE/BSE detector (TLD-SE, TLD-BSE)
• Elstar Column in-column SE/BSE detector (ICD)*
• Everhart-Thornley SE detector (ETD)
• IR camera for viewing sample/column
• High-performance in-chamber electron and ion detector (ICE) for secondary ions (SI) and electrons (SE)
• In-chamber Nav-Cam Sample Navigation Camera*
• Retractable low-voltage, high-contrast directional solid-state backscatter electron detector (DBS)*
• Integrated beam current measurement

Stage and sample

Flexible, five-axis motorized stage:

• XY range: 110 mm
• Z range: 65 mm
• Rotation: 360° (endless)
• Tilt range: -38° to +90°
• XY repeatability: 3 μm
• Max sample height: Clearance 85 mm to eucentric point
• Max sample weight at 0° tilt: 5 kg (including sample holder)
• Max sample size: 110 mm with full rotation (larger samples possible with limited rotation)
• Compucentric rotation and tilt

High-precision, five-axis motorized stage with Piezo-driven XYR axis

• XY range: 150 mm
• Z range: 10 mm
• Rotation: 360° (endless)
• Tilt range: -38° to +60°
• XY repeatability: 1 μm
• Max sample height: Clearance 55 mm to eucentric point
• Max sample weight at 0° tilt: 500 g (including sample holder)
• Max sample size: 150 mm with full rotation (larger samples possible with limited rotation)
• Compucentric rotation and tilt