The ATC-E Series Evaporation Systems can be configured for high rate, low rate, multi-layer and co-deposition applications depending on the chamber, sources, substrate carrier and general configuration chosen. Proper power, crucible liner or boat material, soak, and XY sweep decisions must be made for each material to be evaporated to ensure the desired rates, stability and film characteristics. Typically, materials with good heat transfer properties (eg. Al) do not require XY sweep but may require a liner (Au) whereas materials with poor thermal properties (eg. Cr) tend to tunnel and spit unless the e-beam power is diffused with an XY sweep. Proper substrate fixturing is required to obtain the best uniformity.
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AJA International - Model ATC-E UHV Series -Electron Beam Evaporation Systems for Precision Coating
AJA International's ATC-E UHV Series comprises advanced electron beam evaporation systems designed for precision physical vapor deposition applications. Available in ATC-1800E and ATC-2200E configurations, these systems feature cylindrical, ultra-high vacuum (UHV) chambers for high-quality deposition. They are equipped with versatile deposition sources, including linear multi-pocket UHV e-beam sources and secondary thermal sources, optimized for materials with diverse thermal properties. The systems support co-deposition with the integration of multiple e-beam and thermal sources, enhancing material deposition capabilities. Designed for flexibility and efficiency, they feature adjustable substrate holders with options for heating up to 1000°C and cooling with water or liquid nitrogen. The Phase II-Au control system offers both manual and automated processing modes, simplifying user operations and providing extensive data logging options. This modular design facilitates easy upgrades, ensuring future-proof capabilities for complex coating processes.Most popular related searches
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AJA offers a variety of sources on our ATC-E Series Evaporation Systems. The vertical cylinder ATC-E series chambers are best suited for linear, multi-pocket, UHV, e-beam sources which are side mounted and attached to a convenient slide rail for service and loading access. Spare ports on the chamber bottom straddling the linear e-beam source allow for the addition of multiple secondary thermal evaporation sources. Secondary thermal sources are typically optimized for specific materials (organic materials) or to allow co-evaporation capabilities. The ATC 2200-E system allows (2) UHV multi-pocket linear e-beam evaporation sources for co-evaporation along with secondary thermal sources as well.
6-pocket, 15cc UHV linear
e-beam evaporation sources
6-pocket, 15cc UHV linear e-beam evaporation sources with 4 secondary thermal evaporation sources
Dual 6-pocket, 15cc UHV linear e-beam evaporation sources
Up to 6 thermal evaporation furnaces on easy access slide rail
AJA can fit your customized evaporation system with a wide variety of substrate holders. Our substrate heaters can be equipped with azimuthal rotation, heating up to 1000°C, RF/DC bias capability and tilting in a single axis plane. Our cooled stages can be equipped with H2O or LN2 cooling in the static or rotational modes. Additional features include azimuthal rotation, RF/DC bias and tilting in a single axis plane. Substrate holders can be semi-automatic or fully automated depending on the process requirements. Custom configurations are also available when heating and cooling are required.
For batch coating applications domed-styled substrate carriers optimized for lift-off processing and planetary-style holders are also available. Process gas ring or gas distributor options are offered for reactive processing or applications requiring an anneal step.
Glancing Angle Deposition (GLAD) 4” Substrate
Holder with 800°C heating, rotation, and +/- 180° tilting
Glancing Angle Deposition (GLAD) 6" Substrate
Holder with water cooling, rotation, and +/- 180° tilting