AJA International, Inc. products

Sputtering Systems

AJA International - Model Orion Series - Sputtering Systems for Thin Film Deposition

The Orion Series Sputtering Systems by AJA International are advanced thin film deposition tools tailored for research and industrial applications. Designed as compact alternatives to the ATC Flagship Series, these systems support high vacuum (HV) and ultra-high vacuum (UHV) environments and are ideal for laboratories with budget constraints. Key features include the integration of AJA's Stiletto (HV) and A300-XP (UHV) magnetron sputtering sources, allowing the systems to support up to 8 two-inch or 5 three-inch sputter sources. Additionally, they offer customizable configurations for simultaneous use of thermal, ion, and other deposition techniques. Substrate holders are engineered for tasks requiring rotating deposition, offering temperature capacities up to 1000°C, complete with cooling options for sensitivity handling. The innovative design enables users to execute procedures with minimal particle contamination, ensuring stable deposition rates and facile transitions between processes, facilitated by AJA’s LabVIEW-based Phase II-Au control system.

AJA International - Model ATC Flagship Series - Sputtering Systems

AJA International ATC Flagship Series Sputtering Systems are versatile PVD coating tools which can be built in a variety of configurations to satisfy most requirements. These systems are built around AJA's unique A300-XP (UHV) or Stiletto Series (HV) magnetron sputtering sources which feature in-situ source head tilting allowing precise and repeatable con-focal, direct, and off-axis thin film deposition. All systems include a heavy duty hoist to lift the chamber top for system access.

Evaporation Systems

AJA International - Model ATC-E UHV Series - Electron Beam Evaporation Systems for Precision Coating

AJA International's ATC-E UHV Series comprises advanced electron beam evaporation systems designed for precision physical vapor deposition applications. Available in ATC-1800E and ATC-2200E configurations, these systems feature cylindrical, ultra-high vacuum (UHV) chambers for high-quality deposition. They are equipped with versatile deposition sources, including linear multi-pocket UHV e-beam sources and secondary thermal sources, optimized for materials with diverse thermal properties. The systems support co-deposition with the integration of multiple e-beam and thermal sources, enhancing material deposition capabilities. Designed for flexibility and efficiency, they feature adjustable substrate holders with options for heating up to 1000°C and cooling with water or liquid nitrogen. The Phase II-Au control system offers both manual and automated processing modes, simplifying user operations and providing extensive data logging options. This modular design facilitates easy upgrades, ensuring future-proof capabilities for complex coating processes.

AJA International - Model ATC-E HV Series - Electron Beam Evaporation Systems

AJA International's ATC-E HV Series Electron Beam Evaporation Systems are designed to deliver high-performance physical vapor deposition for various applications. These systems are built with robust stainless steel, box-style chambers, allowing for the integration of single or multi-pocket rotary e-beam sources and other thermal and ion/plasma sources. They are compatible with Knudsen cells and low-temperature evaporation cells for organic materials. Various options such as load-locks, QCM control, and substrate holders with dynamic features like tilting and planetary movement enhance functionality. These systems are adaptable for different deposition requirements, including high-rate and co-deposition, and they accommodate multiple evaporation sources to minimize cross-contamination through isolation shielding and individual shutters. The Phase II-Au computer control system, featuring an extensive user interface, offers both manual and automated processing modes, making it suitable for comprehensive and controlled thin film deposition processes.

Ion Milling Systems

AJA International - Model Orion IMS Series - Ion Milling Systems

AJA International, Inc. offers the ATC Orion Series Ion Milling Systems, designed for high performance in cost-effective settings. These systems feature cylindrical chambers with large hinged doors for easy access and maintenance. A key feature is the substrate holder, capable of handling up to 4-inch wafers with capabilities such as azimuthal rotation, motorized tilt adjustment, and cooling options using H2O, LN2, and backside gas cooling. The system incorporates sputter sources for passivation layers, SIMS end-point detection, and includes gridded DC ion sources ranging from 1 to 8 cm. The ion sources can be configured for high-rate applications or sensitive low-energy processes, using DC/RF Kaufman style or RF sources with grounded grids. Angular incidence reduces source size for uniform etching, improving removal rates with minimized substrate damage. Ion energies range between 50-1200 eV, accommodating diverse milling applications. The system is equipped with UNO Series Substrate Holders for cooling and phase II-Au computer control for comprehensive process management.