Expedius+ - Model UW300Z -Auto Wet Station
The EXPEDIUS™ + is a 300mm batch clean system which is the advanced model of the highly reliable UW300Z EXPEDIUS™, a concept endorsed by many semiconductor manufacturers. The EXPEDIUS™ + is designed for 45nm and beyond technology node and has improved upon its predecessor in both performance and productivity. The configuration of the chemical treatment tanks, pure water rinse tanks, and dryer has been optimized to support FEOL clean, which requires particularly stringent process performance. Standard installation of the new SD2 dryer enables significant reduction of 45nm size or less micro-particles.
The new SD2 which has been improved from TEL`s original IPA dry module decreases the surface tension and prevents pattern destruction of vulnerable structures on the wafer. Furthermore the EXPEDIUS™ + provides high throughput and excellent productivity through a new wafer transportation system with smaller footprint. In addition, its unique batch-formation software option enhances process efficiency regardless of wafer quantity and processing position.