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Energetiq Technology, Inc.
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  5. Electrodeless Z-Pinch - Model EQ-10HP - ...

Electrodeless Z-Pinch - Model EQ-10HP -High Power EUV Light Source 20 Watt

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Researchers into the emerging technology of EUV lithography need a source of EUV photons for a variety of applications. Existing sources of light are often too low in power, unreliable in operation, large, costly and complex. The EQ-10HP is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq`s proven Electrodeless Z-pinch technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications. The EQ-10 has become the workhorse EUV source for the EUV community, through its proven reliability, ease of use, and low operating cost.

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EUV lithography
xenon gas
metrology
microscopy
industrial inspection

The Energetiq EQ-10 EUV Source`s modular design makes it ready to be integrated into a process tool. The system includes the electrodeless Z-pinch source assembly, vacuum and gas subsystems, power delivery subsystem, and control electronics. The EQ-10HP is capable of delivering up to 20 Watts of in-band EUV into 2pi steradians, and will run continuously at pulse repetition rates of up to 2.5kHz kHz.

To accommodate the differing requirements of the various applications, the source operating conditions are user-adjustable. The EUV light output can be optimized for peak power or for peak brightness as required by the user. Plasma size is typically below 1mm in diameter under typical operating conditions. A simple and flexible optical interface is provided to the user on the side of the system enclosure to connect to the application equipment. Custom interfaces are available to meet specific customer requirements. The user interface operates by a color touch screen display, and incorporates menus allowing manual and automatic operation.

EUV

  • Unique design eliminates electrodes and electrode current
    • No electrodes – no electrode debris
  • Plasma is magnetically confined away from source components
    • Reduces debris further
  • Magnetic confinement offers unexcelled spatial stability
  • Lower cost and complexity

  • Unique patent-pending electrodeless Z-Pinch technology
       - Low debris / low consumable cost
  • 20W into 2pi using Xenon 
       - Higher brightness and power for a wide variety of applications
  • Small plasma size
       - Below 1mm diameter
  • Cost-effective and compact
       - Low cost per EUV Watt
       - Small footprint
  • CE-Mark and SEMI S2-0703 compliant
  • EUV Mask Inspection
  • EUV Metrology
  • EUV Resist Development
  • EUV Microscopy