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Despatch - Infrared Thermal Diffusion System
Diffusion technology for the industry’s most uniform emitters. The Despatch In-line Diffusion Furnace incorporates advanced infrared thermal technology that provides the tight temperature uniformity needed for increased cell efficiencies. Air is passively preheated as it enters the chamber and lamps on top and bottom along with edge heaters effectively transfer heat to the wafers. Automated drop-down access to the chamber reduces maintenance time and the insulation in the first zones of the furnace is easily removed if it becomes contaminated. The furnace provides advanced profile capability and a fully comprehensive software system.
In-line processing offers reduced wafer handling and greater throughput than batch processing. With less handling you will have less breakage and increased yield. The Despatch Diffusion Furnace combined with USI’s Deposition tool consistently produces highly uniform emitters using aqueous-based doping. This repeatability enables higher sheet resistances, excellent yields and optimum cell efficiency.
- High volume production
- Exceptional thermal uniformity ± 1°C in the dwell region
- Closed loop temperature controls
- Advanced graphical user interface
- Safe, simple chamber accessibility
- High production up-time
- Ease of maintenance
- Water-cooled heat exchanger
- Failed element monitor
- Master production control interface
- Profiling systems
- Ultrasonic belt cleaner/dryer
- Uninterruptible power supply
- Extended process profiles
- Conveyor table extensions
- CE Compliance
In-line diffusion furnace
- Tight temperature control for maximum process window
- Maximum up-time for higher yields
- Process profiles for high efficiency solar cells
Integrated Process Control Sy stem
- Doper/Furnace recipe creation
- Process window monitoring with audible and visual alarming
- Real-time process window display
- Data logging
- Process repeatability
