MetroStress - Model 101 -Semiconductor Wafer Stress Measurement

Faced with the increasing complexity of semiconductor manufacturing processes, IDMs and foundries rely on high performance production-worthy transparent film metrology for fabwide process control. Metrosemi’s MetroStress 101 of metrology systems deliver superior measurement accuracy, repeatability and tool-to-tool matching on a highly reliable and flexible platform. Utilizing Metrosemi’s patented focused beam laser ellipsometry (FBE) system with optional deep ultraviolet reflectometry, visible reflectometry, the MetroStress 101 System has been qualified to provide on-product process control for logic and memory processes down to the 1x node.