MicroSys - Model 200 / 300 -Plasma Deposition

The MicroSys system is designed as a cost effective and high-quality solution for various applications in research and for small scale production. The system control and vacuum components are incorporated in a single cabinet. It can be adapted to RIE, PVD and PECVD and can process different substrate sizes up to 200 mm / 300 mm in diameter. The modular concept of MicroSys 200 / MicroSys 300 allows a customized setup of plasma sources and sample heating or cooling.