Model NEO-Series -Fabrication System

The system is capable of writing nano-scale structures at high speed directly on to the surface of a resist coated substrate (examples of typical substrates include semiconductor wafers or glass). The substrates are rotated in normal air condition. Compared to conventional lithography systems the NEO-500 has advantages of compact size and low investment costs without comprising performance. These advantages are achieved by using a visible semiconductor laser as a light source and Pulstec`s uniquely designed optics.