Kratos - Model Minibeam 4 -Monatomic Ar+ Ion Source
This ion source is designed to produce a stable, high current, monatomic Ar+ ion beam with energies from 0.5 to 4 keV. High ion flux guarantees excellent sputter depth profiling etch rates. The Minibeam 4 is ideally suited to sputter cleaning and depth profiling inorganic and metallic films. It may also be used to generate low-energy He+ ions for use with ion scattering spectroscopy (ISS).
Capabilities of the Minibeam 4 monatomic Ar+ ion source
The Minibeam 4 is an ideal sputter source for sample cleaning and sputter depth profiling inorganic or metallic thin-films and multilayer materials. It is capable of generating a high flux, focussed beam of monatomic Ar+ ions. The ion source is fully integrated with the ESCApe data-system, which automates gas handling.
The monatomic Ar+ ion source, is used for sample cleaning and sputter depth profiling most classes of materials. The energy of the monatomic ions mean that this source will cause significant chemical damage to organic, polymer materials for which the Minibeam 6 is better employed.
Materials ideally suited to monatomic depth profiling are highlighted here.
As standard the AXIS Supra+ is configured with the Minibeam 4 monatomic Ar+ source. This high flux ion source is fully software controlled and capable of generating depth profiles from a wide range of materials.
The application areas highlighted below demonstrate the diverse capabilities of the monatomic ion source, along with an article published here.