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W&LModel RTM 25/80 -Rotating Tube Magnetron Sputtering Cathode

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The RTM 25/80 Rotating Tube Magnetron Sputtering Cathode offers an innovative approach to magnetron sputtering, particularly valuable for its economic benefits associated with tubular sputtering targets. By rotating the tubular target through the plasma, the system ensures efficient cooling, allowing significantly higher power densities on the target surface compared to planar targets. This results in increased deposition rates and enhanced cost-effectiveness of the sputtering process. The RTM 25/80 features an integrated magnetic field and target cooling system within the target tube. Users can select the nominal target length in 50 mm increments between 200 and 1000 mm, with an option to extend the target length up to approximately 2000 mm using an additional counter bearing. This flexibility makes the RTM 25/80 an adaptable and powerful solution for various sputtering applications, optimizing deposition rates and cooling efficiency to improve overall productivity.
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Magnetron sputtering has become economically very interesting due to the introduction of tubular sputtering targets and represents more than just an alternative to the (reactive) vapor deposition process.

With the permanent rotation of the tubular target through the plasma, where the target erosion takes place, very effective cooling of the target can be achieved, which allows a two to three times higher power density to be achieved on the target surface than possible for planar targets. With higher power density, the reachable deposition rate of a magentron sputtering cathode and thus its cost-effectiveness naturally increase.

Rotating tube magnetron with compact end block for tube targets

The RTM 25/80 tubular cathode is designed as a modular system. The compact end block carries the drive system for the target rotation and the 0 - 360° magnetic field rotation. Furthermore, all connections for control, sputtering power supply and cooling water are located here. A shaft extension can be implemented to adapt to individual machine geometries.

The magnetic field and the target cooling are enclosed as an integrated unit by the target tube. The nominal target length can be freely selected in 50 mm increments from 200 – 1000 mm.

The end piece closes the target tube. It can be expanded to include a counter bearing so that longer nominal target lengths (up to approx. 2000 mm) can be achieved.
  • End block for DC, AC, unipolar and bipolar pulsed power
  • Highly efficient cooling water routing in the target tube allows operation in any installation position of the cathode
  • Magnetic fields rotatable by 360° with motor drive
  • Suitable for all target materials on Ø80 mm support tubes up to 1 meter long without counter bearings. Even longer with a counter bearing.
  • Design of end block and pipe cooling up to 30 kW electrical power
  • Uniform target erosion