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MiniLab - Model 060 -Thermal Evaporation Systems
The most popular platform in our MiniLab range, MiniLab 060 systems have front-loading box-type chambers ideal for multiple-source magnetron sputtering but also thermal and e-beam evaporation.
The MiniLab 060 standard configuration includes a turbomolecular pump positioned on an ISO160 port at the rear of the vacuum chamber. The vacuum chamber sits on a double-rack frame that contains all system control electronics and power supplies. MiniLab 060 systems are available with load-locks—please call for details.
Tools can be equipped with a wide variety of deposition techniques, including thermal and low-temperature evaporation sources (for metals and organics), magnetron sputtering cathodes (for metals and inorganics), and electron-beam sources (for most material classes except organics). Deposition sources are typically mounted on the chamber baseplate, but sputter-down configurations are also available.
Substrate stages, usually at the top of the chamber, can accommodate substrate sizes up to 11” diameter. Substrate heating, rotation, bias and Z-shift are available, together with planetary stages and source and substrate shutters. Configurations range from a manually operated thermal evaporation system up to a multi-technique tool with fully-automated process control.
- Modular design
- ‘Clam-shell’ or bell-jar chambers
- Turbomolecular pumping systems
- Base pressures
- Up to 6” diameter substrates
- Touchscreen HMI/PC for system control
- Equipped for easy servicing
- Comprehensive safety features and interlocks
- Cleanroom compatible
- Proven performance
- Glovebox-compatible
- Pumping: Rotary or scroll backing pumps.
- Gas/pressure: Manual or automatic control via MFCs and throttle valves.
- Stages: Rotation, heating, and Z-shift.
- Shutters: Source and substrate, pneumatic or motorised.
- Operation: Manual or automatic via front panels, touchscreen HMI or PC.
- Process: Quartz crystal sensor heads for rate/thickness monitoring or feedback-loop control.
Three-source TE3 thermal evaporation component with source shutter and rotation stage. High power TEC-4A power supply and controller with recipe-based automated control. Quartz crystal sensor head with PC software for rate/thickness monitoring.
Two-source TE2 thermal evaporation component for metals and LTE-1CC component for organics. Source shutters and rotation stage. Evaporation power supplies linked to quartz crystal sensor head and Inficon SQC-310 process controller for automated process control per user-defined rates/thicknesses.
Water-cooled magnetron source for 2″ diameter targets. RF power supply for metals and dielectrics. Source shutter and rotation stage. Recipe-based power vs. time process control.