SVCS Process Innovation s.r.o.
- Home
- Companies
- SVCS Process Innovation s.r.o.
- Products
- SVCS - Vertical Thermal Reactor (VTR)
SVCS - Vertical Thermal Reactor (VTR)
SVCS Vertical Thermal Reactor (VTR) is designed for all standard atmospheric and low pressure CVD processes. VTR is available with several lengths of flat zone for both mass production and R&D application. The single tube set-up with dual boat logistics is optimized for minimum down time as well as low maintenance costs.
Most popular related searches
temperature profiling
cooling water
atmospheric diffusion
clean air
water cooling
well maintenance
air cleaning
Atmospheric Processes
- Diffusion (drive-in) high temperature procesess
- Doping from solid, liquid and gaseous dopant sources e.g.: BBr3, B2H6, POCL3, PH3, BN
- Various thermal processing e.g. annealing, sintering
- Pyrogenic Wet Oxide with External Burning System
- Dry Oxide
LPCVD Processes
- Silicon nitride / low stress nitride
- Low temperature oxide (LTO)
- High temperature oxide (HTO)
- TEOS oxide
- Polysilicon, with tilt/flat temperature profile
- Doped polysilicon
- Oxynitride
- Automatic wafer handling system for loading wafers from SMIF or FOUP closed pods
- Special automatic loading system which allows loading wafers from open cassettes and provides an exceptionally small footprint
- Quartz or SiC boats can be used
- Highly tailored state of the art modular control system, in house designed and manufactured
- 10,4“ high-res touchscreen for operator interface
- Wafer size (mm) 100, 150, 200, 300 or any custom size
- Wafer load 25 – 150 wafers/batch
- Heating system 3 or 5 zones
- Flat zone up to 600 mm (24″)
- Process temperature 200 oC – 1230 oC, ± 0.5 oC across flat zone
- Power consumption 22kW – 30kW
- Power supply (adapted to power grid of destination country) 3-phase, 400 or 480VAC, 40 – 100 A, 50 or 60 Hz
- Clean dry air 70 – 110 psig (4,8 to 7,6 bar)
- Cooling water 10 – 15 LPM
- Exhaust 170 m³/h