Vsparticle - Model VSP-A1 -Diffusion Accessory
The VSP-A Series accessories can be easily connected to the output of the VSP-G1, enabling any researcher to produce nanoparticle samples in a matter of hours, with minimal effort. Typical sample preparation time is 1-60 minutes. Go from hypothesis to result in the same day.
Dispersed particles (A1), Coated filters (A2), Porous layers (A3)
With VSPARTICLE Accessories pure nanoparticles are generated and deposited on any kind of substrate. You can make a sample with dispersed particles, a nanoporous layer or coated filters with great material flexibility. You can use any kind of (semi)conductive source material: pure, alloys, compacted alloys, mixed materials, oxides and other combinations.
The spark ablation process used inside the devices is a purely physical process that only requires electricity, a carrier gas and electrode material to produce clean nanoparticles. No additional chemicals are required for the production or to stabilize the particles in the aerosol. The produced nanoparticles can be directly incorporated into the next process step or applied in a product by, for example, impaction, electrostatic precipitation or filtering. This way the unique physical properties of the nanoparticles are directly available in the product. The carrier gas can simply be recirculated, minimizing the environmental impact of the process.
- Dispersed, unagglomerated particles
- Sample ready in 1-10 minutes
- From hypothesis to particle sample in less than one hour
- Sample size 10x10 mm
- Substrate types: e.g. (in-situ) TEM chips, Electrodes, (doped) Si chips
- Production rate: 1-10 mg per hour