ASML Veldhoven products

The TWINSCAN NXE:3600D is ASML’s latest-generation lithography system, supporting EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes. 13.5 nm: EUV light wavelength, 13 nm: Resolution, 0.33 NA: Projection optics, ≥160: Wafers per hour At dose: 30 mJ/cm²

The TWINSCAN NXE:3400C lithography system supports EUV volume production at the 7 and 5 nm nodes. 13.5 nm: EUV light wavelength, 13 nm: Resolution, 0.33 NA: Projection optics, ≥ 170: Wafers per hour Atdose:20mJ/cm2

The?TWINSCAN NXT:2050i is a high-productivity, dual-stage immersion lithography tool designed for volume production of 300 mm wafers at advanced nodes. 193 nm: ArF light source, ≤38nm: Resolution, 1.35NA: Projection optics, 295: Wafers per hour

The TWINSCAN NXT:2000i delivers outstanding overlay, focus control and cross-matching for high-volume manufacturing of advanced Logic and DRAM nodes. 193 nm: ArF light source, ≤38nm: Resolution, 1.35 NA: Projection optics, ≥275: Wafers per hour

The industry’s most productive lithography platform yet is the first to go beyond 300 wafers per hour. 193 nm: ArF light source, ≤57 nm: Resolution, 0.93 NA: Projection optics, ≥300: Wafers per hour