ASML Veldhoven products

The TWINSCAN NXE:3600D is ASML’s latest-generation lithography system, supporting EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes. 13.5 nm: EUV light wavelength, 13 nm: Resolution, 0.33 NA: Projection optics, ≥160: Wafers per hour At dose: 30 mJ/cm²

The TWINSCAN NXE:3400C lithography system supports EUV volume production at the 7 and 5 nm nodes. 13.5 nm: EUV light wavelength, 13 nm: Resolution, 0.33 NA: Projection optics, ≥ 170: Wafers per hour Atdose:20mJ/cm2