ASML Veldhoven products

DUV Lithography Systems - Immersion Systems

Model TWINSCAN NXT:2050i - High-Productivity, Dual-Stage Immersion Lithography Tool

The?TWINSCAN NXT:2050i is a high-productivity, dual-stage immersion lithography tool designed for volume production of 300 mm wafers at advanced nodes. 193 nm: ArF light source, ≤38nm: Resolution, 1.35NA: Projection optics, 295: Wafers per hour

Model TWINSCAN NXT:2000i - DUV Lithography

The TWINSCAN NXT:2000i delivers outstanding overlay, focus control and cross-matching for high-volume manufacturing of advanced Logic and DRAM nodes. 193 nm: ArF light source, ≤38nm: Resolution, 1.35 NA: Projection optics, ≥275: Wafers per hour