Hiden Analytical Ltd. articles

Traditional X-ray Photoelectron Spectroscopy (XPS) is a cornerstone technique for investigating the surface chemistry of materials. However, conventional XPS systems operate under ultra-high vacuum (UHV) conditions — a controlled environment necessary for accurate measurements, but far removed from the pressures and reactive conditions most materials experience in real-world applications.

The chemistry of a material’s outermost nanometres often determines its functional performance, making accurate surface characterisation vital for modern materials research. Yet, analysing these nanometre-scale layers is inherently challenging, as many surface-sensitive chemistry techniques, like AES, can modify the material or disturb its native chemical composition and techniques like EDX (Energy dispersive X-ray) do not have surface specificity. For ultra-clean surfaces, even minimal

Following the success of our recent discussion on electrochemical mass spectrometry, we sat down with Jim Melling, Senior Applications Specialist, and Andrea Secco, Applications Specialist — both members of the Gas Applications Team at Hiden Analytical — to discuss the latest developments in the ECL-Series electrochemical cells for the HPR-40 DEMS system.

In this Q&A, Jim and Andrea answer frequently asked questions about ECL-Static, ECL-Insigh

The wait is over. Introducing the ECL Series — a new range of versatile accessories designed to expand the capabilities of the HPR-40 DEMS, transforming it into a turnkey system for real-time gas and volatile species analysis in electrochemical research. Developed by Hiden Analytical, the ECL Series brings together precision engineering, modular flexibilit

The European Union’s Battery Regulation (EU 2023/1542) marks a new era for energy storage technologies. One of its most significant features is the introduction of the EU Battery Passport — a digital system designed to ensure transparency, sustainability, and traceability throughout the entire battery value chain.

From February 2027, every large industrial and electric vehicle (EV) battery placed on the EU market will be required to have a unique digital record detailing i

Advanced semiconductor manufacturing necessitates control at every stage of the fabrication process, with etch processes being among the most critical to perform with precision. Even a microscopic deviation at a material interface can impact device performance, yield, and long-term reliability. Secondary Ion Mass Spectrometry (SIMS)-based end point detection has emerged as a dependable way to determine exactly when an etch process should stop, helping engineers maintain tight process windows

Timing is everything in thin film etching. Having the process halt at the right moment is critical to protecting underlying layers, maintaining uniformity, and maximising yield. This level of control hinges on thin film end point recipes, logical frameworks that interpret real-time secondary ion mass spectrometry signals to detect when a target layer has been removed. Developing these recipes, however, has traditionally required time-consuming, wafer-dependent trials that drain resources and

Introduction

In a recent article, Physics World highlighted how the integration of mass spectrometry into the electrolysis workstation is transforming electrochemical research. By synchronizing electrical signals with gas evolution data, researchers can uncover reaction pathways that were previously hidden. This capability is especially powerful for studies in carbon dioxide reduction, syngas production, an