Meyer Burger products

The IonSys 800 system is designed for industrial ion beam etching and deposition processes with maximum quality and productivity requirements. The combination of multi-layer etching and deposition in one tool is possible. The reliability, uptime and compatibility with clean room class 100 compliance with all the requirements for advanced production equipment in microelectronics and optics. The advanced IonSys 800 can also be configured as a cluster system and is equipped with an automatic handling robot that features a cassette load-lock.

The MicroSys system is designed as a cost effective and high-quality solution for various applications in research and for small scale production. The system control and vacuum components are incorporated in a single cabinet. It can be adapted to RIE, PVD and PECVD and can process different substrate sizes up to 200 mm / 300 mm in diameter. The modular concept of MicroSys 200 / MicroSys 300 allows a customized setup of plasma sources and sample heating or cooling.