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E Beam Environmental Equipment & Supplies
2 equipment items found
Manufactured by:Advantest America,Inc. based inSan Jose, CALIFORNIA (USA)
The F7000 is an EB lithography tool with superior resolution performance meeting requirements for the 1Xnm technology node. The F7000 supports substrates of diverse materials, sizes, and shapes, including nano-imprint templates, as well as wafers, and is optimized for diverse applications such as advanced LSIs, photonics, MEMS, and other nano-processes. Also, users can select the configuration ...
Manufactured by:Advantest America,Inc. based inSan Jose, CALIFORNIA (USA)
Low-Cost, High Throughput EB Lithography Tool Supports Ultrafine Pattern Fabrication for Diverse Substrates. The F5113 is an electron-beam lithography system supporting 200mm and 3-inch through to 6-inch substrates, making it an optimal tool for processing advanced LSIs, compound semiconductor wafers, magnetic heads, smart power devices, photonics devices, MEMS, and other devices requiring ...