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Semicorex Environmental Equipment & Supplies
7 equipment items found
Manufactured by:Semicorex Advanced Material Technology Co.,Ltd. based inJiangbei District, CHINA
Semicorex's SiC-Coated ICP Component is designed specifically for high-temperature wafer handling processes such as epitaxy and MOCVD. With a fine SiC crystal coating, our carriers provide superior heat resistance, even thermal uniformity, and durable chemical ...
Manufactured by:Semicorex Advanced Material Technology Co.,Ltd. based inJiangbei District, CHINA
Semicorex's ICP Plasma Etching Tray is engineered specifically for high-temperature wafer handling processes such as epitaxy and MOCVD. With a stable, high-temperature oxidation resistance of up to 1600°C, our carriers provide even thermal profiles, laminar gas flow patterns, and prevent contamination or impurities ...
Manufactured by:Semicorex Advanced Material Technology Co.,Ltd. based inJiangbei District, CHINA
Semicorex's Etching Carrier Holder for PSS Etching is engineered for the most demanding epitaxy equipment applications. Our ultra-pure graphite carrier can withstand harsh environments, high temperatures, and harsh chemical cleaning. The SiC coated carrier has excellent heat distribution properties, high thermal conductivity, and is cost-effective. Our products are widely used in many European ...
Manufactured by:Semicorex Advanced Material Technology Co.,Ltd. based inJiangbei District, CHINA
Semicorex's PSS Handling Carrier for Wafer Transfer is engineered for the most demanding epitaxy equipment applications. Our ultra-pure graphite carrier can withstand harsh environments, high temperatures, and harsh chemical cleaning. The SiC coated carrier has excellent heat distribution properties, high thermal conductivity, and is cost-effective. Our products are widely used in many European ...
Manufactured by:Semicorex Advanced Material Technology Co.,Ltd. based inJiangbei District, CHINA
Most SiC substrate producers use a crucible design that involves a porous graphite cylinder for the hot field process. The process involves placing high-purity SiC particles between the graphite crucible wall and the porous graphite cylinder while deepening the crucible and increasing its diameter. This increases the evaporation area of the feedstock while also increasing the charge volume. ...
Manufactured by:Semicorex Advanced Material Technology Co.,Ltd. based inJiangbei District, CHINA
When it comes to wafer handling processes such as epitaxy and MOCVD, Semicorex's High-Temperature SiC Coating for Plasma Etch Chambers is the top choice. Our carriers provide superior heat resistance, even thermal uniformity, and durable chemical resistance thanks to our fine SiC crystal ...
Manufactured by:Semicorex Advanced Material Technology Co.,Ltd. based inJiangbei District, CHINA
TaC coating graphite is created by coating the surface of a high-purity graphite substrate with a fine layer of tantalum carbide by a proprietary Chemical Vapor Deposition (CVD) process. Tantalum carbide (TaC) is a compound that consists of tantalum and carbon. It has metallic electrical conductivity and an exceptionally high melting point, making it a refractory ceramic material known for its ...