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Semicorex - Etching Carrier Holder for PSS Etching
Semicorex`s Etching Carrier Holder for PSS Etching is engineered for the most demanding epitaxy equipment applications. Our ultra-pure graphite carrier can withstand harsh environments, high temperatures, and harsh chemical cleaning. The SiC coated carrier has excellent heat distribution properties, high thermal conductivity, and is cost-effective. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.
At Semicorex, we have designed the Etching Carrier Holder for PSS Etching specifically for the harsh environments required for epitaxial growth and wafer handling processes. Our ultra-pure graphite carrier is ideal for thin-film deposition phases like MOCVD, epitaxy susceptors, pancake or satellite platforms, and wafer handling processing such as etching. The SiC coated carrier has high heat and corrosion resistance, excellent heat distribution properties, and a high thermal conductivity. Our products are cost-effective and offer a good price advantage.
Contact us today to learn more about our Etching Carrier Holder for PSS Etching.
- Avoid peeling off and ensure coating on all surface
- High temperature oxidation resistance: Stable at high temperatures up to 1600°C
- High purity: made by CVD chemical vapor deposition under high temperature chlorination conditions.
- Corrosion resistance: high hardness, dense surface and fine particles.
- Corrosion resistance: acid, alkali, salt and organic reagents.
- Achieve the best laminar gas flow pattern
- Guarantee evenness of thermal profile
- Prevent any contamination or impurities diffusion