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Robotechnik - Model OPTIhot HB20+ -Hotplate Machine
The future technology in the semi conductor industry and production- bench mounted Hotplate System for typical lithography baking applications:
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OPTIhot HB 20+
- Bench Mounted Hotplate System for wafer up to Ø 8"
(Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150 mm)
System consists of:
- Bench Mounted Hotplate System for wafer up to Ø 8"
- Hotplate System with cover
- Recipe programmable lifting pins (proximity) for 2" - 8" wafer
- Recipe programmable Nitrogen (N2) blow
- 19" controller unit
- Input display unit with touch
- Preset and calibrated Temperature Controller
- Including software for PC / Notebook - For more comfortable
- recipe writing and storage
- Including an ENGLISH manual on standard paper and a CD-ROM
- Price without installation and training
- Voltage: UAC= 230 V / N / PE / 50 Hz (60 Hz) / 16A
- Temperature range: Up to 300°C - Adjustable in 0.1°C steps
- Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
- Lifting pins (Proximity): From Ø 2" up to Ø 8" - Programmable in 0.1 mm steps
- Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
- Process exhaust: Outer diameter OD 38mm, 30m3/h
- Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
- Vacuum: -0.8 ± 0.2 bar
- Nitrogen (N2): 4.0 ± 0.5 bar
- CE marked system
This is a customizable product with a very large amount of options available. Please contact our sales department for more information and support to get a product customized to your needs.