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ResinTech - Model WBMP -Styrenic Macroporous Weak Base Anion Resin
ResinTech WBMP is a styrenic macroporous weak base anion resin with moderate strong base functionality. WBMP is a weak base anion resin with very good rinse characteristics that can be efficiently regenerated with a variety of alkaline chemicals, or with waste caustic left over from regeneration of strong base anion resin. ResinTech WBMP is intended for use in multibed demineralizers. It can also be used in resource recovery systems and for selective ion removal (when used in the acid salt form). WBMP is supplied in the free base form, or can be special ordered in the acid salt form (when ordered as WBMP-HCl), or with the strong base sites regenerated into the hydroxide form (when ordered as WBMP-OH).
- Polymer Structure: Styrene/DVB
- Polymer Type: Macroporous
- Functional Group: Dimethylamine
- Physical Form: Spherical Beads
- Ionic Form (as shipped): Free Base
- Total capacity: > 1.45 meq/mL (FB Form)
- Water Retention: 53 to 60 percent (FB Form)
- Approximate Shipping Weight : 40 lbs/cu.ft. (FB Form)
- Swelling: 15 to 25 percent Free Base to Cl
- Screen Size Distribution : 16 to 50 (U.S. Mesh)
- Maximum Fines Content: 1 percent (less than 50 Mesh)
- Minimum Sphericity: 95 percent
- Uniformity Coefficient: 1.6 (Approximate)
- Resin Color: White to Tan
High Operating Capacity
Tertiary amine functionality provides nearly 100% caustic regeneration efficiency
Resistant to Organic Fouling
Able to reversibly adsorb naturally occurring organic substances when used in demineralization systems
Superior Physical Stability
95% plus sphericity and high crush strengths together with carefully controlled particle distribution provides long life and low pressure drop
Complies With US FDA Regulations
Conforms to paragraph 21CFR173.25 of the Food Additives Regulations of the US FDA
Demineralizer
ResinTech WBMP can be used in a two bed system following a strong acid cation unit (such as CG8-H) where weakly acidic anions such as silica and carbon dioxide do not have to be completely removed. Where complete removal of all anions is required, WBMP can be placed ahead of a strong base anion unit (such as SBG1P-OH). WBMP will efficiently remove strong acids such as chlorides, sulfates and nitrates, leaving silica and carbon dioxide to be removed by the strong base resin. WBMP is easily regenerated with modest caustic dosages or with waste caustic left over from the strong base anion unit.
Organic Removal
ResinTech WBMP is easily regenerated with sodium hydroxide, allowing the removal of organic acid anions as part of demineralization process utilizing an upstream hydrogen form strong acid cation exchanger. The use of WBMP in front of a hydroxide form strong base anion exchanger can help reduce organic fouling of the strong base anion resin, increasing run lengths between regenerations and reducing the rinse volume required before return to service. Because free base form weak base anion resins are only able to absorb acids, the feedwater must be significantly acidic or the resin must be preconverted into the acid sulfate or acid chloride form prior to use.