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RobotechnikModel OPTIcoat ST75 -Spin Coating Machine

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The future technology in the semiconductor industry and production- Coating System with a process optimized covered chuck technology:

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OPTIcoat ST 75

  • Stand - Alone Spin Coating System with "Covered Chuck"
    technology for Wafers up to Ø 750 mm and substrates
    up to 20" x 20" (508 mm x 508 mm) for covered chuck spinning 

System consists of:

  • Stand - Alone cabinet with all process modules integrated
  • Spinner System with Covered Chuck technology and automatic substrate pin lift
  • Multi piece process bowl with splash ring 
  • Input display unit with touch 
  • Including software for PC / Notebook - For more comfortable 
  • recipe writing and storage
  • Including an ENGLISH manual on standard paper and a CD-ROM
  • Requires at least one chuck (Not included !)
  • Voltage: UAC= 3 x 400 V / N / PE / 50 Hz (60 Hz) / 16A
  • Motor speed: 1 up to 2,000 rpm - Adjustable in 1 rpm steps (depends on substrate weight and size) 
  • Motor acceleration ramp: 1 up to 2.500 rpm/s - Adjustable in 1 rpm/s steps (depends on substrate / chuck weight and size)
  • Spinning time: 1 up to 999 s - Adjustable in 0.1 s steps
  • Substrate size: Up to Ø 750 mm or 20" x 20" (508 mm x 508 mm)
  • Process bowl: Standard made of Polypropylene (PP)
  • Process exhaust#1: Outer diameter OD 110 mm, 200m3/h
  • Process exhaust#2+#3: Outer diameter OD 110 mm, each 200m3/h
  • Cabinet exhaust#1: Outer diameter OD 140 mm, 300m3/h
  • Cabinet exhaust#2: Outer diameter OD 110 mm, 200m3/h
  • Drain: 5 liter waste tank and high-level sensor
  • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
  • Vacuum: -0.8 ± 0.2 bar
  • Nitrogen (N2) Optional: 4.0 ± 0.5 bar
  • CE marked system

This is a customizable product with a very large amount of options available. Please contact our sales department for more information and support to get a product customized to your needs.