Critical Systems, Inc. products

The Critical Systems engineering and technical staff has reconditioned and customized 1000’s of gas cabinets and other gas systems used for a virtually all gas types and processes. We can supply a gas cabinet for: Pyrophoric and/or Flammable Gases: Silane (SiH4), Methane (CH4), etc. Corrosive and/or Toxics: Boron Trichloride (BCl3), Phosphine (PH3), etc. Deposition Processes: CVD (PECVD, LPCVD, MOCVD). Nitride Etch, Reactive Ion Etch, Ion Beam Etch Diffusion Processes: Diffusion Processes: Doping Silicon, Oxidation Enhanced.

CSI’s high purity fabrication shop has built 100”s of customized and standard process gas panels for semiconductor and related processes over the past decade.  Our weld shop technicians are highly experienced in high purity (UHP) fabrication, and regularly exceed the highest of industry standards for length tolerance and alignment.

The Delatech CDO 858/859 Exhaust Gas Scrubber has long been considered the standard for Advanced Chemical Vapor Deposition (CVD) Process gas abatement, and has been effectively used with all PECVD, LPCVD & MOCVD process gases.   Delatech scrubbers are also widely used in Thin Film processes. This versatile gas scrubber utilizes a combination Thermal Oxidation Chamber and a Primary/Secondary Cooling Wet Scrubbing Chamber to effectively abate toxic, flammable and corrosive gases.

The Edwards Gas Reactor Column (GRC) gas scrubber uses a unique hot bed reactor technology to handle gas flows up to 60 slpm and destroy hazardous gases to below TLV (Threshold Limit Value) levels.  GRCs require no water supply and present no duct corrosion issues associated with the back-streaming of moisture.    Reactive process by-products are chemically converted to harmless inorganic salts that are locked into the cartridge allowing for safe disposal.