Eumetrys products

YPI-MX-DC model detects on transparent substrates, contamination of particles up to 0.1µm. Working on wafers from 2 to 8 inches, it can inspect materials such as SiC and GaN. Its laser of 355nm of wavelength eases analysis on compound semiconductor industry substrates. For the most exotic applications, it is possible to double the number of optical heads. It is also possible to add a second detector channel which improves measurement accuracy.

EUMETRYS now sells the new IVS 220 system, a high throughput automated optical measurement system at the cutting edge of metrology

EFiT-TT is a compact equipment allowing to measure layer thickness with a great simplicity. This interferometry tool is extremely flexible and is destined to laboratories, research institutes and semiconductor industry. Its reduced size will save space in your clean room and its low cost will not cut the budget you can allocate to your R&D.