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Brooks - Model MFCs-GF100 -Mass Flow Controllers
Embedded diagnostics leverage real-time EtherCAT data acquisition capabilities. Ultra-stable flow sensor (≤ 0.15% of S.P. drift per year) enables tighter low set point accuracy and reduces maintenance requirements. Improved valve shutdown (≤ 0.15% of bin range) reduces valve leak-by to reduce first wafer effects. Newly enhanced pressure transient insensitivity reduces crosstalk sensitivity for consistent mass flow delivery.
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- Long-term zero stability of <±0.15% full scale per year
- Settling times: 300 ms - <1 second
- Full-scale flow rates up to 300 slpm
- All-metal seal flow path: option for 5µ or 10µ inch Ra surface finish
- Corrosion-resistant Hastelloy® T-Rise sensor improves measurement reproducibility at elevated temperatures
- MultiFloTM gas and range programmability—one device, thousands of gas types and range combinations without removing the MFC from the gas line or compromising accuracy
- Convenient user display and independent diagnostic/service port aids device installation, monitoring and troubleshooting
- GF120 Safe Delivery System (SDS®) is Brooks’ state-of-the-art low pressure drop mass flow controller for the delivery of sub atmospheric safe delivery system (SDS) gases used in Implant and Etch processes
- GF120xHT high-temperature mass flow controller can withstand operating environments of up to 150°C
- Exceptional performance
- Rapid reaction times improve application efficiency
- Flexible topology
- Virtually limitless network topology possible
- Simple and robust
- Configuration, diagnostics, and maintenance
- Affordability
- Standard Ethernet port
- Semiconductor etch tools
- Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD)
- Physical vapor deposition (PVD) systems
- Epitaxial process systems
- Advanced strip processes